Electrochemical behavior of TiN film coated Ti−Nb alloys for dental materials-Reference-Cited by-同舟云学术

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Electrochemical behavior of TiN film coated Ti−Nb alloys for dental materials

Published:2006-08 Issue:4 Volume:12 Page:365-369
ISSN:1598-9623
Container-title:Metals and Materials International
language:en
Short-container-title:Met. Mater. Int.

Author:

Choe Han-Cheol,Ko Yeong-Mu,Park Ha-Ok

Publisher

Springer Science and Business Media LLC

Subject

Materials Chemistry,Metals and Alloys,Mechanics of Materials,Condensed Matter Physics

Link

http://link.springer.com/content/pdf/10.1007/BF03027555.pdf

Reference13 articles.

1. H. C. Choe, Y. M. Ko, and K. Y. Hwang,J. of the Jap. Institute of Metals. 65, 253 (2001).

2. B. Rangert, P. H. J. Krogh, B. Langer, and N. Van Roekel,Int. J. Oral Maxillofac. Implants. 10, 136 (1995).

3. T. J. Balshi,Int. J. Oral Maxillofac. Implants 11, 660 (1996).

4. A. Piattelli,Int. J. Oral Maxillofac. Implants 13, 561 (1998).

5. J. K. Lee, J. H. Jeong, and H. C. Choe,J. Dent. Res. IADR80, 644 (2001).

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