Machine learning-assisted smart epitaxy of III–V semiconductors
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Publisher
Springer Science and Business Media LLC
Link
https://link.springer.com/content/pdf/10.1007/s40843-024-3006-x.pdf
Reference6 articles.
1. Hansen DM, Kuech TF. Epitaxial technology for integrated circuit manufacturing. In: Encyclopedia of physical science and technology (third edition). New York: Academic Press, 2003. 641–652
2. Shen C, Zhan W, Li M, et al. Development of in situ characterization techniques in molecular beam epitaxy. J Semicond, 2024, 45: 031301
3. Cheng KY. Development of molecular beam epitaxy technology for III–V compound semiconductor heterostructure devices. J Vacuum Sci Tech A-Vacuum Surfs Films, 2013, 31: 050814
4. Anselm KA, Hwang WY, Ren HW, et al. Manufacturing of laser diodes grown by molecular beam epitaxy for coarse wavelength division multiplexing systems. J Vacuum Sci Tech B-MicroElectron Nanometer Struct Processing Measurement Phenomena, 2008, 26: 1167–1170
5. Shen C, Zhan W, Xin K, et al. Machine-learning-assisted and real-time-feedback-controlled growth of InAs/GaAs quantum dots. Nat Commun, 2024, 15: 2724
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