Defect passivation using ultrasound treatment: fundamentals and application-Reference-Cited by-同舟云学术

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Defect passivation using ultrasound treatment: fundamentals and application

Published:1999-08-01 Issue:2 Volume:69 Page:225-232
ISSN:0947-8396
Container-title:Applied Physics A: Materials Science & Processing
language:
Short-container-title:Applied Physics A: Materials Science & Processing

Author:

Ostapenko S.

Publisher

Springer Science and Business Media LLC

Subject

General Materials Science,General Chemistry

Link

http://link.springer.com/content/pdf/10.1007/s003390050994.pdf

Cited by 25 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Intensification of iron–boron complex association in silicon solar cells under acoustic wave action;Journal of Materials Science: Materials in Electronics;2022-05-05

2. Features of FeB pair light-induced dissociation and repair in silicon n+-p-p+ structures under ultrasound loading;Journal of Applied Physics;2021-12-21

3. Formation of Nanoclusters on the Adsorbed Surface under the Action of Comprehensive Pressure and Electric Field;Фізика і хімія твердого тіла;2019-10-18

4. Acoustically driven degradation in single crystalline silicon solar cell;Superlattices and Microstructures;2018-05

5. Effect of ultrasound on reverse leakage current of silicon Schottky barrier structure;Journal of Semiconductors;2016-11-24

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