Grain boundary diffusion of Cu in TiN film by X-ray photoelectron spectroscopy-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Grain boundary diffusion of Cu in TiN film by X-ray photoelectron spectroscopy

Published:2000-04-01 Issue:4 Volume:70 Page:431-434
ISSN:0947-8396
Container-title:Applied Physics A: Materials Science & Processing
language:
Short-container-title:Applied Physics A: Materials Science & Processing

Author:

Lim K.Y.,Lee Y.S.,Chung Y.D.,Lyo I.W.,Whang C.N.,Won J.Y.,Kang H.J.

Publisher

Springer Science and Business Media LLC

Subject

General Materials Science,General Chemistry

Link

http://link.springer.com/content/pdf/10.1007/s003390051062.pdf

Cited by 20 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Low-Temperature Diffusion Behavior of Ti in Cu/Ti-Ti/Cu Bonding;Journal of Electronic Materials;2022-03-08

2. Detailed phisyco-chemical characterization of the multilayered thin films based on titanium oxynitride and copper doped titanium nitride obtained by different PVD techniques;Vacuum;2022-01

3. Application of Computed Tomographic Image Reconstruction Algorithms Based on Filtered Back-Projection in Diagnosis of Bone Trauma Diseases;Journal of Medical Imaging and Health Informatics;2020-05-01

4. Response of <110> symmetric tilt grain boundary in titanium nitride under shear;Engineering Analysis with Boundary Elements;2019-08

5. Structure and shear response of <001> tilt grain boundary in titanium nitride;Ceramics International;2019-04

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP