Characterization and properties of controlled nucleation thermochemical deposition (CNTD)-silicon carbide-Reference-Cited by-同舟云学术

Characterization and properties of controlled nucleation thermochemical deposition (CNTD)-silicon carbide

Published:1980-09 Issue:9 Volume:15 Page:2183-2191
ISSN:0022-2461
Container-title:Journal of Materials Science
language:en
Short-container-title:J Mater Sci

Author:

Dutta Sunil,Rice Roy W.,Graham Henry C.,Mendiratta Madan C.

Publisher

Springer Science and Business Media LLC

Subject

Mechanical Engineering,Mechanics of Materials,General Materials Science

Link

http://link.springer.com/content/pdf/10.1007/BF00552305.pdf

Reference10 articles.

1. F. I. Baratta,Amer. Ceram. Soc. Bull. 57 (1978) 806.

2. R. A. Holzl, ?Investigation of CNTD Mechanism and Its Effect on Microstructural Properties in Silicon Carbide?, Special Topical Report, Chemetal Corp., Pacoima, California, AFOSR; Contract No. F49620-77-C-0036, July (1977).

3. S. W. Freiman, J. J. Mecholsky, W. J. McDonough andR. W. Rice, in ?Ceramics for High Performance Applications?, Vol. II, edited by J. J. Burke, E. N. Lenoe, and R. N. Katz, (Brook Hill, Chestnut Hill, Mass., 1977) pp. 1069?76.

4. IITRI-D6114-ITR-36;D. C. Larsen,1978

5. IITRI-D6114-ITR-30;D. C. Larsen,1978

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