Double layer silica antireflective films with high strength and rub resistance prepared by sol gel method

Abstract

AbstractThe single-layer silica antireflective film with base catalysis prepared by sol gel method is an important part of the high-power laser facility for inertial confinement fusion, while the weak adhesion between the single-layer silica film and the substrate during the preparation process makes it susceptible to be contacted erasure and unable to be used. Double-layer silica antireflective (DLAR) films of different thicknesses were obtained using the base catalysis sol–gel method, in which the upper layer was coated with a relatively dense thin layer, and the performances of the films were characterized. The results showed that the transmittances of the DLAR films with different thicknesses were ˃99.0%, and in which one of the maximum transmittance peaks reached to 99.83% @ 1000 nm. The surface roughness of the DLAR films was < 2.0 nm, and the surfaces of the films were flat. The contact angles between DLAR films and water reached 118° and maintained stable in high humidity environment. The laser induced damage thresholds for different thickness DLAR films (peak transmittances @ 400, 600, 800, 1000 nm) were comparable to device requirements by 1-on-1 testing method, and the DLAR films exhibited high strength and good friction resistance. Graphical abstract