Formation and thermal decomposition of silicon oxynitride compounds II-Reference-Cited by-同舟云学术

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Formation and thermal decomposition of silicon oxynitride compounds II

Published:1987-03 Issue:2 Volume:32 Page:445-449
ISSN:0368-4466
Container-title:Journal of Thermal Analysis
language:en
Short-container-title:Journal of Thermal Analysis

Author:

Podsiadło S.

Publisher

Springer Science and Business Media LLC

Link

http://link.springer.com/content/pdf/10.1007/BF01912696.pdf

Reference5 articles.

1. S. Podsiadlo, J. Thermal Anal, 32 (1987).

2. S. Podsiadlo, Polish J. Chem., 58 (1984) 339.

3. S. Podsiadlo, Polish J. Chem., 58 (1984) 653.

4. Y. Laurent, F. F. Grekov, J. David and J. Guyader, Ann. Chim. Fr., 5 (1980) 647.

5. Y. Laurent and J. Guyader, Acta Cryst., B37 (1981)911.

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2. An Unexpected New Member of the Family of Lithium Oxonitridosilicates – Li₇Si₂NO₆;European Journal of Inorganic Chemistry;2023-07-07

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