Flexible Evanescent Wave Interference Lithography System for Sub-half-Wavelength Complex Relief Structures Fabrication
Author:
Funder
Japan Society for the Promotion of Science
Publisher
Springer Science and Business Media LLC
Subject
Industrial and Manufacturing Engineering,Mechanical Engineering,Materials Science (miscellaneous)
Link
https://link.springer.com/content/pdf/10.1007/s41871-021-00104-8.pdf
Reference29 articles.
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3. Kikuta H, Ohira Y, Iwata K (1997) Achromatic quarter-wave plates using the dispersion of form birefringence. Appl Opt 36(7):1566–1572. https://doi.org/10.1364/AO.36.001566
4. Zhang X, Shi F, Niu J, Jianga J, Wang Z (2008) Superhydrophobic surfaces: from structural control to functional application. J Mater Chem 18:613–618. https://doi.org/10.1039/B711226B
5. Gao X, Yan X, Yao X, Xu L, Zhang K, Zhang J, Yang B, Jiang L (2007) The dry-style antifogging properties of mosquito compound eyes and artificial analogues prepared by soft lithography. Adv Mater 19:2213–2217. https://doi.org/10.1002/adma.200601946
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