Structure and properties of films grown on Si, Ta, Ti, Mo, W, and Ni substrates by reactive ion-beam sputtering-Reference-Cited by-同舟云学术

Structure and properties of films grown on Si, Ta, Ti, Mo, W, and Ni substrates by reactive ion-beam sputtering

Published:2005-02 Issue:2 Volume:41 Page:148-151
ISSN:0020-1685
Container-title:Inorganic Materials
language:en
Short-container-title:Inorg Mater

Author:

Ignatenko P. I.,Klyakhina N. A.,Badekin M. Yu.

Publisher

Springer Science and Business Media LLC

Subject

Materials Chemistry,Metals and Alloys,Inorganic Chemistry,General Chemical Engineering

Link

http://link.springer.com/content/pdf/10.1007/s10789-005-0034-z.pdf

Reference11 articles.

1. Ignatenko, P.I., Klyakhina, N.A., and Badekin, M. Yu., Structure and Properties of Metal Nitride Films Produced by Ion Implantation, Neorg. Mater., 2005, vol. 41, no. 1, pp. 40?45 [Inorg. Mater. (Engl. Transl.), vol. 41, no. 1, pp. 36?41].

2. Andrievskii, R.A., Kalinnikov, G.V., Kobelev, N.P., et al., Structure and Physicomechanical Properties of Nanostructured Boron Nitride Films, Fiz. Tverd. Tela (S.-Peterburg), 1997, vol. 39, no. 10, pp. 1859?1864.

3. Andrievskii, R.A., Synthesis and Properties of Films of Interstitial Compounds, Usp. Khim., 1997, vol. 66, no. 1, pp. 57?77.

4. Andrievskii, R.A., Synthesis and Properties of Silicon Nitride, Usp. Khim., 1995, vol. 64, no. 4, pp. 311?329.

5. Myers, S., Ion-Implanted Metallic Layers, Thin Films: Interdiffusion and Reactions, Poate, J., Tu, K., and Mayer, J., Eds., New York: Wiley, 1978. Translated under the title Tonkie plenki. Vzaimnaya diffuziya i reaktsii, Moscow: Mir, 1982, pp. 539?572.

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