An overall mechanism for the deposition of plasma polymers from methane in a low-pressure argon plasma jet-Reference-Cited by-同舟云学术

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An overall mechanism for the deposition of plasma polymers from methane in a low-pressure argon plasma jet

Published:1994-09 Issue:3 Volume:14 Page:277-299
ISSN:0272-4324
Container-title:Plasma Chemistry and Plasma Processing
language:en
Short-container-title:Plasma Chem Plasma Process

Author:

Fusselman Steven P.,Yasuda Hirotsugu K.

Publisher

Springer Science and Business Media LLC

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,General Chemical Engineering,General Chemistry

Link

http://link.springer.com/content/pdf/10.1007/BF01447082.pdf

Reference57 articles.

1. H. Yasuda, T. J. O'Keefe, D. L. Cho, and B. K. Sun,J. Appl. Polym. Sci.: Appl. Polym. Symp. 46, 243 (1990).

2. E. M. Charlson, E. J. Charlson, S. Burkett, and H. K. Yasuda,J. Appl. Polym. Sci.: Appl. Polym. Symp. 46, 109 (1990).

3. T. Hirotsua and S. Nakajima,Sen'i Gakkaishi 43, 666 (1987). ]

4. K. W. Gerstenberg,Maier. Sci. Eng. A139, 110 (1991).

5. A. S. Hoffman,Adv. Polym. Sci. 57, 142 (1985).

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