Controlled thermal kinetics in RTP-Reference-Cited by-同舟云学术

Controlled thermal kinetics in RTP

Published:1998-12 Issue:12 Volume:27 Page:1286-1290
ISSN:0361-5235
Container-title:Journal of Electronic Materials
language:en
Short-container-title:Journal of Elec Materi

Author:

Niess J.,Grunwald Ch.,Strohmaier R.,Nényei Z.

Publisher

Springer Science and Business Media LLC

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://link.springer.com/content/pdf/10.1007/s11664-998-0087-2.pdf

Reference8 articles.

1. T. Speranza, T. Riley, A. Nanda, et al., Mater. Res. Soc. Symp Proc. 429 (Pittsburgh, PA: Mater. Res. Soc., 1996), p. 429.

2. Z. Nényei, G. Wein, W. Lerch, C. Grunwald, J. Gelpey and S. Wallmüller, 5th Intl. Conf. On Advanced Thermal Processing of Semiconductors - RTP’97, New Orleans, (1997), p. 35.

3. F. Glowacki, B. Froeschle, L. Beutschmann, et al., MRS Spring Mtg. (Pittsburgh, PA: Mater. Res. Soc., 1997), in press.

4. Z. Nényei, A. Gschwandtner and S. Marcus, 3rd Intl. Rapid Thermal Processing Conf. - RTP ’95, Amsterdam, (1995), p. 58.

5. G. Ghidini and F.W. Smith, J. Electrochem. Soc. 131 (12), 2924 (1984).

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