Micelle formation induced by photo-Claisen rearrangement of poly(4-allyloxystyrene)-block-polystyrene-Reference-Cited by-同舟云学术

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Micelle formation induced by photo-Claisen rearrangement of poly(4-allyloxystyrene)-block-polystyrene

Published:2009-04-14 Issue:7 Volume:287 Page:789-793
ISSN:0303-402X
Container-title:Colloid and Polymer Science
language:en
Short-container-title:Colloid Polym Sci

Author:

Yoshida Eri,Kuwayama Satoshi

Publisher

Springer Science and Business Media LLC

Subject

Materials Chemistry,Colloid and Surface Chemistry,Polymers and Plastics,Physical and Theoretical Chemistry

Link

http://link.springer.com/content/pdf/10.1007/s00396-009-2029-9.pdf

Reference55 articles.

1. Delzenne GA (1979) Adv Photochem 11:1

2. Pappas SP (ed) (1978) UV curing: science and technology. Technology Marketing, Norwalk, CT

3. Wentink SG, Koch SD (eds) (1981) UV curing in screen printing for printed circuits and the graphic arts. Technology Marketing, Norwalk, CT

4. Garrison LR (1980) Radiat Curing 7:26

5. Anderson JC, Reese CB (1960) Proc Chem Soc 217.

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