Epitaxial growth of CeO 2 on (100) InP using reactive r.f. magnetron sputtering-Reference-Cited by-同舟云学术

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Epitaxial growth of CeO 2 on (100) InP using reactive r.f. magnetron sputtering

Published:2002-12-01 Issue:6 Volume:75 Page:699-702
ISSN:0947-8396
Container-title:Applied Physics A: Materials Science & Processing
language:
Short-container-title:Applied Physics A: Materials Science & Processing

Author:

Ivill M.,Patel M.,Kim K.,Bae H.,Pearton S.J.,Norton D.P.,Budai J.D.

Publisher

Springer Science and Business Media LLC

Subject

General Materials Science,General Chemistry

Link

http://link.springer.com/content/pdf/10.1007/s003390201411.pdf

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Pulse laser deposition fabricated InP/Al-ZnO heterojunction solar cells with efficiency enhanced by an i-ZnO interlayer;Applied Physics A;2015-09-22

2. Other Epitaxial Oxides on Semiconductors;Integration of Functional Oxides with Semiconductors;2014

3. Epitaxial Growth and Properties of Doped Transition Metal and Complex Oxide Films;Advanced Materials;2010-01-12

4. Synthesis and properties of epitaxial electronic oxide thin-film materials;Materials Science and Engineering: R: Reports;2004-03

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