Load balancing and optimization of distributed proximity effect correction on a temporally heterogeneous cluster
Author:
Publisher
Springer Science and Business Media LLC
Subject
Computer Networks and Communications,Software
Link
http://link.springer.com/content/pdf/10.1007/s10586-011-0183-6.pdf
Reference23 articles.
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2. Eisenmann, H., Waas, T., Hartmann, H.: PROXECCO-proximity effect correction by convolution. J. Vac. Sci. Technol. B 11(6), 2741–2745 (1993)
3. Parikh, M.: Corrections to proximity effects in electron beam lithography. II. Implementation and III Experiments. J. Appl. Phys. 50(6), 4378–4387 (1979)
4. Peckerar, M., Bass, R., Rhee, K.: Sub-0.1 u electron-beam lithography for nanostructure development. J. Vac. Sci. Technol. B 18(6), 3143–3149 (2000)
5. Osawa, M., Takahashi, K., Sato, M., Arimoto, H.: Proximity effect correction using pattern shape modification and area density map for electron-beam projection lithography. J. Vac. Sci. Technol. B 19(6), 2483–2487 (2001)
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