Influencing Factors of Reheating Shrinkage Rate of Glass Substrate on LTPS Process-Reference-Cited by-同舟云学术

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Influencing Factors of Reheating Shrinkage Rate of Glass Substrate on LTPS Process

Published:2020-08 Issue:4 Volume:35 Page:682-685
ISSN:1000-2413
Container-title:Journal of Wuhan University of Technology-Mater. Sci. Ed.
language:en
Short-container-title:J. Wuhan Univ. Technol.-Mat. Sci. Edit.

Author:

Wang Weilai,Tian Yingliang,Wang Wei,Liu Yaru,Sun Shibing,Lü Feng,Chen Xinxin

Publisher

Springer Science and Business Media LLC

Subject

General Materials Science

Link

https://link.springer.com/content/pdf/10.1007/s11595-020-2307-4.pdf

Reference19 articles.

1. Zhang RJ. OLED Application and Market[J]. Electronic Commerce in China: Basic Electronics, 2007(10): 68–70

2. Chen ZQ. Low Temperature Polycrystalline Silicon (LTPS) Display Technology[M]. Beijing: Science Press, 2006

3. BOE Technology Group Co., Ltd. A Manufacturing Method of Low Temperature Polysilicon TFT Array Substrate[P]. China, https://doi.org/102543860A.2012-07-04

4. Sichuan Hongshi Display Technology Co., Ltd. The LTPS Process[P]. China, 103972169A. 2014-08-06

5. Meakin D, Stoemenos J, Migliorato P, et al. Structural Studies of Low-temperature Low-pressure Chemical Deposited Polycrystalline Silicon[J]. Journal of Applied Physics, 1987, 61(11): 5 031–5 037

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