A real-time exposure dose control algorithm for DUV excimer lasers
Author:
Publisher
Springer Science and Business Media LLC
Subject
Electrical and Electronic Engineering,Electronic, Optical and Magnetic Materials
Link
http://link.springer.com/content/pdf/10.1007/s12200-008-0015-3.pdf
Reference9 articles.
1. Levinson H J. Principles of Lithography. Washington: SPIE Press, 2001
2. Yu M L, Sagle A, Buller B. Exploring the fundamental limit of CD control: a model for shot noise in lithography. In: Proceedings of SPIE, 2005, 5751: 687–698
3. Inoue S, Fujisawa T, Izuha K. Effective exposure dose measurement in optical microlithography. In: Proceedings of SPIE, 2000, 3998: 810–818
4. Kivenzor G J. Self-sustaining dose control system: ways to improve the exposure process. In: Proceedings of SPIE, 2000, 4000: 835–842
5. Das P. Excimer laser as a total light source solution for DUV microlithography. In: Proceedings of SPIE, 2001, 4184: 323–329
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