Characteristics and function of vapour gaseous envelope fluctuation in plasma electrolytic polishing-Reference-Cited by-同舟云学术

Characteristics and function of vapour gaseous envelope fluctuation in plasma electrolytic polishing

Published:2022-01-27 Issue:11-12 Volume:119 Page:7815-7825
ISSN:0268-3768
Container-title:The International Journal of Advanced Manufacturing Technology
language:en
Short-container-title:Int J Adv Manuf Technol

Author:

Zhou Chuanqiang,Su Honghua,Qian Ning,Zhang Zhao,Xu Jiuhua

Funder

innovative research group project of the national natural science foundation of china

foundation of graduate innovation centre in nuaa

Publisher

Springer Science and Business Media LLC

Subject

Industrial and Manufacturing Engineering,Computer Science Applications,Mechanical Engineering,Software,Control and Systems Engineering

Link

https://link.springer.com/content/pdf/10.1007/s00170-021-08606-x.pdf

Reference32 articles.

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3. Gliozzi AS, Hernández S, Alexe-Ionescu AL, Saracco G, Barbero G (2015) A model for electrode effects based on adsorption theory. Electrochim Acta 178:280–286. https://doi.org/10.1016/j.electacta.2015.07.043

4. Parfenov EV, Yerokhin A, Nevyantseva RR, Gorbatkov MV, Liang CJ, Matthews A (2015) Towards smart electrolytic plasma technologies: an overview of methodological approaches to process modelling. Surf Coat Technol 269:2–22. https://doi.org/10.1016/j.surfcoat.2015.02.019

5. Parfenov EV, Farrakhov RG, Mukaeva VR, Gusarov AV, Nevyantseva RR, Yerokhin A (2016) Electric field effect on surface layer removal during electrolytic plasma polishing. Surf Coat Technol 307:1329–1340. https://doi.org/10.1016/j.surfcoat.2016.08.066

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