An efficient electrochemical polishing of tungsten with combined forced and natural convections-Reference-Cited by-同舟云学术

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An efficient electrochemical polishing of tungsten with combined forced and natural convections

Published:2021-08-18 Issue:9-10 Volume:117 Page:2819-2834
ISSN:0268-3768
Container-title:The International Journal of Advanced Manufacturing Technology
language:en
Short-container-title:Int J Adv Manuf Technol

Author:

Chen Peixuan,Chen Yuanlong,Lin Hua,Li Huigui,Li Xiang

Publisher

Springer Science and Business Media LLC

Subject

Industrial and Manufacturing Engineering,Computer Science Applications,Mechanical Engineering,Software,Control and Systems Engineering

Link

https://link.springer.com/content/pdf/10.1007/s00170-021-07856-z.pdf

Reference19 articles.

1. Tsao B-H, Ramalingam ML, Donovan BD, Cloyd JS (1991) Thermionic energy conversion with a preferentially oriented tungsten emitter. AIP Conf Proc 217:787–792

2. Shi JQ, Shen YB, Yao SY, Zhang PJ, Zhou Q, Guo YZ, Tan CW, Yu XD, Nie ZH, Ma HL, Cai HN (2016) On the tungsten single crystal coatings achieved by chemical vapor transportation deposition. Mater Charact 122:36–44

3. Mu RD, Tan CW, Yu XD (2016) Proportion quantitative analysis and etching of {110} planes on tungsten single crystal coating surface. J Alloys Compd 666:71–76

4. Deng H, Huang R, Liu K, Zhang XQ (2017) Abrasive-free polishing of tungsten alloy using electrochemical etching. Electrochem Commun 82:80–84

5. Wang F, Zhang XQ, Deng H (2019) A comprehensive study on electrochemical polishing of tungsten. Appl Surf Sci 475:587–597

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1. Mechanism of Anodic Dissolution of Tungsten in Sulfate–Fluoride Solutions;Metals;2024-09-02

2. A general approach for controllable surface structuring of metals via through-mask electrochemical micromachining under isotropic etching mode;Journal of Solid State Electrochemistry;2024-07-09

3. Study on rheological properties and polishing performance of viscoelastic material for dilatancy pad;Precision Engineering;2022-09

4. Effects of pH Values and H2O2 Concentrations on the Chemical Enhanced Shear Dilatancy Polishing of Tungsten;Micromachines;2022-05-12

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