Nanofabrication of arbitrary patterns by nano plastic forming and etching (NPFE)-Reference-Cited by-同舟云学术

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Nanofabrication of arbitrary patterns by nano plastic forming and etching (NPFE)

Published:2012-07-04 Issue:1-4 Volume:66 Page:461-468
ISSN:0268-3768
Container-title:The International Journal of Advanced Manufacturing Technology
language:en
Short-container-title:Int J Adv Manuf Technol

Author:

Rashidi Hassan,Yoshino Masahiko

Publisher

Springer Science and Business Media LLC

Subject

Industrial and Manufacturing Engineering,Computer Science Applications,Mechanical Engineering,Software,Control and Systems Engineering

Link

http://link.springer.com/content/pdf/10.1007/s00170-012-4341-7.pdf

Reference30 articles.

1. Brunner TA (2003) Why optical lithography lives forever. J Vac Sci Technol B 21:2632–2637

2. Mordechai R et al (2003) Recent trends in optical lithography. Linc Lab J 14:221–236

3. Fischer BP, Chou SY (1993) 10 nm electron beam lithography and sub-50 nm overlay using a modified electron scanning microscope. Appl Phys Lett 62:2989–2991

4. Tseng AA, Chen K, Chen CD, Ma KJ (2003) Electron beam lithography in nanoscale fablication: recent developments. IEEE Trans Electron Packag Manuf 62(2):141–149

5. Huigao D, Donald W, Joel KWY, Bryan MC, Vitor RM, Karl KB (2010) Sub-10-nm half-pitch electron-beam lithography by using poly(methylmethacrylate) as a negative resist. J Vac Sci Technol B 28(6):C6C58–C6C62

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1. Nano/Micro Processing;Journal of the Japan Society for Technology of Plasticity;2014

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