Substrate temperature estimation and control in advanced MOCVD process for superconductor manufacturing-Reference-Cited by-同舟云学术

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Substrate temperature estimation and control in advanced MOCVD process for superconductor manufacturing

Published:2024-05-13 Issue:1-2 Volume:133 Page:273-285
ISSN:0268-3768
Container-title:The International Journal of Advanced Manufacturing Technology
language:en
Short-container-title:Int J Adv Manuf Technol

Author:

Chebbi Amal,Grigoriadis Karolos,Franchek Matthew,Cescon Marzia

Funder

Advanced Manufacturing Institute University of Houston

Publisher

Springer Science and Business Media LLC

Link

https://link.springer.com/content/pdf/10.1007/s00170-024-13699-1.pdf

Reference28 articles.

1. Miller LM, Coleman JJ (2006) Metalorganic chemical vapor deposition. Crit Rev Solid State Mater Sci 15:1–26. https://doi.org/10.1080/10408438808244623

2. Yang FH (2014) 2-Modern metal-organic chemical vapor deposition (MOCVD) reactors and growing nitride-based materials. Adv Mater Technol, pp 27–65. https://doi.org/10.1533/9780857099303.1.27

3. Selvamanickam V, Xie Y, Reeves J, Chen Y (2004) MOCVD-based YBCO-coated conductors. MRS Bull 29:579–582. https://doi.org/10.1557/mrs2004.164

4. Majkic G, Pratap R, Galstyan E, Xu A, Zhang Y, Selvamanickam V (2017) Engineering of nanorods for superior in field performance of 2G-HTS conductor utilizing advanced MOCVD reactor. IEEE Trans Appl Supercond 27:1–5. https://doi.org/10.1109/TASC.2016.2637328

5. Pratap R, Majkic G, Galstyan E, Mohanasundaram G, Chakradhar S, Selvamanickam V (2019) Growth of high-performance thick film REBCO tapes using advanced MOCVD. IEEE Trans Appl Supercond 29:1–5. https://doi.org/10.1109/TASC.2019.2899244

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1. Correction to: Substrate temperature estimation and control in advanced MOCVD process for superconductor manufacturing;The International Journal of Advanced Manufacturing Technology;2024-05-23

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