Metal Germanide Technology
Author:
Publisher
Springer Berlin Heidelberg
Link
http://link.springer.com/content/pdf/10.1007/978-3-662-49683-1_3
Reference19 articles.
1. Lee K, Liew S, Chua S, Chi D, Sun H, Pan X (2004) Formation and morphology evolution of nickel germanides on Ge (100) under rapid thermal annealing. In: MRS Proceedings, p C2. 4
2. Ashburn SP, Öztürk MC, Harris G, Maher DM (1993) Phase transitions during solid-state formation of cobalt germanide by rapid thermal annealing. J Appl Phys 74:4455–4460
3. Mueller M, Zhao Q, Urban C, Sandow C, Buca D, Lenk S et al (2008) Schottky-barrier height tuning of NiGe/n-Ge contacts using As and P segregation. Mater Sci Eng B 154:168–171
4. Colgan E, Mäenpää M, Finetti M, Nicolet M (1983) Electrical characteristics of thin Ni2Si, NiSi, and NiSi2 layers grown on silicon. J Electron Mater 12:413–422
5. Nash A, Nash P (1987) The Ge-Ni (Germanium-Nickel) system. Bull Alloy Phase Diagrams 8:255–264
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