Vacuum lithography?A completely dry lithography using plasma processing

Author:

Tamano Junji,Hattori Shuzo,Morita Shinzo,Yoneda Katsumi

Publisher

Springer Science and Business Media LLC

Subject

Surfaces, Coatings and Films,Condensed Matter Physics,General Chemical Engineering,General Chemistry

Reference9 articles.

1. J. L. Vossen and W. Kern, eds.,Thin Film Processes (Academic Press, New York, 1978).

2. J. R. Hollahan and A. T. Bell, eds.,Techniques and Applications of Plasma Chemistry (Wiley, New York, 1974).

3. M. Shen, ed.,Plasma Chemistry of Polymers (Marcel Dekker, New York, 1976).

4. M. Shen and A. T. Bell, eds.,Plasma Polymerization, ACS Symposium Series 108, ACS (1979).

5. T. Sugano, ed.,Semiconductor Plasma Process Technology (in Japanese) (Sangyo-tosho, 1980).

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