Growth mechanisms of grain boundary allotriomorphs in Al-4Pct Cu at high homologous temperatures: Interfacial vs direct volume diffusion-Reference-Cited by-同舟云学术

Growth mechanisms of grain boundary allotriomorphs in Al-4Pct Cu at high homologous temperatures: Interfacial vs direct volume diffusion

Published:1970-07 Issue:7 Volume:1 Page:1805-1810
ISSN:0360-2133
Container-title:Metallurgical Transactions
language:en
Short-container-title:MT

Author:

Goldman Jon,Aaronson Hubert I.,Aaron Howard B.

Publisher

Springer Science and Business Media LLC

Subject

Materials Chemistry,Metals and Alloys,Mechanics of Materials,Condensed Matter Physics,Metals and Alloys,Mechanics of Materials,Condensed Matter Physics

Link

http://link.springer.com/content/pdf/10.1007/BF02642774.pdf

Reference12 articles.

1. H.B. Aaron and H.I. Aaronson:Acta Met, 1968, vol. 16, p. 789.

2. A.D. Brailsford and H.B. Aaron:J. Appl. Phys., 1968, vol. 40, p. 1702.

3. B. Hawbolt and L.C. Brown:Trans. TMS-AIME, 1967, vol. 239, p. 1916; E. B. Hawbolt: Ph.D. Thesis, Univ. of British Columbia, 1967.

4. G. Thomas and M.J. Whelan:Phil. Mag., 1961, vol. 6, p. 1103.

5. J.B. Murphy:Acta Met., 1961, vol. 9, p. 563.

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