Investigation of fused silica glass etching using C4F8/Ar inductively coupled plasmas for through glass via (TGV) applications-Reference-Cited by-同舟云学术

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Investigation of fused silica glass etching using C4F8/Ar inductively coupled plasmas for through glass via (TGV) applications

Published:2015-02-04 Issue:1 Volume:22 Page:119-127
ISSN:0946-7076
Container-title:Microsystem Technologies
language:en
Short-container-title:Microsyst Technol

Author:

Lin Laicun,Jing Xiangmeng,Wang Qidong,Jiang Feng,Cao Liqiang,Yu Daquan

Publisher

Springer Science and Business Media LLC

Subject

Electrical and Electronic Engineering,Hardware and Architecture,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://link.springer.com/content/pdf/10.1007/s00542-015-2449-z.pdf

Reference30 articles.

1. Abdolahad M, Nilchi JN, Mohajerzadeh S (2010) Fluorine-free high-resolution selective plasma etching of silicon-oxide layers on silicon substrates. J Phys D Appl Phys 43(39):395402

2. Ahamed MJ, Senkal D, Trusov AA et al (2013) Deep NLD plasma etching of fused silica and borosilicate glass. Sensors, 2013 IEEE. IEEE, 2013, pp 1–4

3. Akashi T, Yoshimura Y (2006) Deep reactive ion etching of borosilicate glass using an anodically bonded silicon wafer as an etching mask. J Micromech Microeng 16:1051–1056

4. Anthony CJ, Docker PT, Prewett PD et al (2007) Focused ion beam microfabrication in Foturan™ photosensitive glass. J Micromech Microeng 17(1):115

5. Baram A, Naftali M (2006) Dry etching of deep cavities in Pyrex for MEMS applications using standard lithography. J Micromech Microeng 16(11):2287

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3. Deep multilevel wet etching of fused silica glass microstructures in BOE solution;Scientific Reports;2023-03-30

4. Perspectives of reactive ion etching of silicate glasses for optical microsystems;Journal of Optical Microsystems;2021-12-22

5. Broadband antireflection and hydrophobic CaF2 film prepared with magnetron sputtering;Applied Surface Science;2021-09

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