Author:
Ababneh A.,Kreher H.,Schmid U.
Publisher
Springer Science and Business Media LLC
Subject
Electrical and Electronic Engineering,Hardware and Architecture,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference17 articles.
1. Ababneh A, Kreher H, Seidel H, Schmid U (2007) The influence of varying sputter deposition conditions on the wet chemical etch rate of AlN thin films.In: SPIE-Conference on “Microtechnologies for the New Millenium”, Gran Canaria, vol. 6589, pp 65890U, 2.5.–4.5
2. Adam T, Kolodzey J, Swann CP, Tsao MW, Rabolt JF (2000) The electrical properties of MIS capacitors with AlN gate dielectrics. Appl Surf Sci 175:428
3. Assouar MB, Elmazria O, Elhakiki M, Alnot P (2004) Study of structural and microstructural properties of AlN films deposited on silicon and quartz substrates for surface acoustic wave devices. J Vac Sci Technol B 22:1717
4. Callister W (2001) Fundamentals of materials science and engineering. Wiley, New York. ISBN 0-471-39551-x
5. Cheng H, Lin T, Chen W (2003) Preparation of [002] oriented AlN thin films by mid frequency reactive sputtering technique. Thin Solid Films 425:85
Cited by
35 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献