A novel fabrication process for MEMS spiral inductors realized on oxide islands

Author:

Kifle Teweldebrhan,Chandra Sudhir,Koul S. K.

Publisher

Springer Science and Business Media LLC

Subject

Electrical and Electronic Engineering,Hardware and Architecture,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Reference27 articles.

1. Ahn CH, Allen MG (1998) Micromachined planar inductors on silicon wafers for MEMS applications. IEEE Trans Ind Electron 45(6):866–876

2. Burghartz JN, Rejaei B (2003) On the design of RF spiral inductors on silicon. IEEE Trans Electron Devices 50(3), March 2003, Invited Paper

3. Carazzetti P (2006) High Quality Micromachined Inductors”, Institute of Microtechnology University of Neuchtel, Ph.D thesis, 2006 for Integrated Communication Systems

4. Chua CL, Fork DK, Van Schuylenbergh K, Lu JL (2003) High-Q RF coils on silicon integrated circuits. Proc SPIE 4981:150–155

5. Dai CL, Hong JY, Liu MC (2008) Hight Q-factor CMOS MEMS inductor. DTIP of MEMS and MOEMS, pp 9–11, April 2008

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