Author:
Brunet Magali,Dubreuil Pascal,Mahfoz-Kotb Hicham,Gouantes Aline,Dorthe Anne-Marie
Publisher
Springer Science and Business Media LLC
Subject
Electrical and Electronic Engineering,Hardware and Architecture,Condensed Matter Physics,Electronic, Optical and Magnetic Materials
Reference19 articles.
1. Ayón AA, Braff R, Lin CC, Sawin HH, Schmidt MA (1999) Characterization of a time multiplexed inductively coupled plasma etcher. J Electrochem Soc 146(1):339–349
2. Benazzi A, Brunet M, Dubreuil P, Mauran N, Bary L, Laur J-P, Sanchez J-L, Isoird K (2007) Performance of 3D capacitors integrated on silicon for DC–DC converter applications. European Conference on Power Electronics and Applications
3. Blauw MA (2004) Deep anisotropic dry etching of silicon microstructures by high-density plasmas, PhD Thesis, Delft University of Technology
4. Borror CM, Montgomery DC (2000) Mixed resolution designs as alternatives to Taguchi inner/outer array designs for robust design problems. Qual Reliab Eng Int 16:117–127
5. Box GEP, Hunter JS, Hunter WG (2005) Statistics for experimenters. Wileys Series in Probability and Statistics, Second edition
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