Analysis of sputter deposited and evaporated tantalum oxide layers on SiO2 by SNMS, XPS, TDS and TRFA-Reference-Cited by-同舟云学术

Analysis of sputter deposited and evaporated tantalum oxide layers on SiO2 by SNMS, XPS, TDS and TRFA

Published:1989-01 Issue:4-5 Volume:333 Page:498-501
ISSN:0016-1152
Container-title:Fresenius' Zeitschrift für analytische Chemie
language:en
Short-container-title:Z. Anal. Chem.

Author:

Müller K. -H.,Rupertus V.,Oechsner H.,Scheuer V.,Tschudi T.

Publisher

Springer Science and Business Media LLC

Subject

Clinical Biochemistry,General Materials Science,General Medicine,Analytical Chemistry

Link

http://link.springer.com/content/pdf/10.1007/BF00572362.pdf

Reference7 articles.

1. Müller KH, Seifert K, Wilmers M (1985) J Vac Sci Technol A3:1367

2. Geiger JF, Kopnarski M, Oechsner H, Paulus H (1987) Mikrochim Acta 1:497

3. Oechsner H, Ufert KD, Rupertus V, Köpfer P (1988) Tagungsband zum 1. Statusseminar “Dünnschichttechnologien”. VDI-Technologiezentrum, Physikalische Technologien Düsseldorf, 3.1

4. Young L (1961) Anodic oxide films, Academic Press, London

5. Becker J, Scheuer V, Tschudi T, Weber H (1988) Forschungsbericht zum F + E-Vorhaben 13N5310 4A (unpublished)

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