Sputtered-atom energy relaxation in a plasma-Reference-Cited by-同舟云学术

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Sputtered-atom energy relaxation in a plasma

Published:1982-10 Issue:10 Volume:25 Page:869-873
ISSN:0038-5697
Container-title:Soviet Physics Journal
language:en
Short-container-title:Soviet Physics Journal

Author:

Zhiglinskii A. G.,Izmailov A. M.,Kuchinskii V. V.,Sheikin E. G.

Publisher

Springer Science and Business Media LLC

Subject

General Physics and Astronomy,General Physics and Astronomy

Link

http://link.springer.com/content/pdf/10.1007/BF00891653.pdf

Reference10 articles.

1. R. Basic and J. J. Daniere, Phys. D: Appl. Phys.,3, 586 (1970).

2. N. V. Pleshivtsev, Cathode Sputtering [in Russian], Atomizdat, Moscow (1968).

3. L. D. Landau and E. M. Lifshits, Mechanics [in Russian], Nauka, Moscow (1971).

4. A. D. Frank-Kamenetskii, Simulation of Neutron Paths in Reactor Calculations by Monte Carlo Methods [in Russian], Atomizdat, Moscow (1978).

5. V. V. Dunaev, Author's Abstract of Candidate's Dissertation, Leningrad (1979).

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Mathematical simulation of transport processes in modern sputter-deposition techniques of thin films;Journal of Crystal Growth;1995-02

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