Argon Cluster Sputtering Source for ToF-SIMS Depth Profiling of Insulating Materials: High Sputter Rate and Accurate Interfacial Information-Reference-Cited by-同舟云学术

Argon Cluster Sputtering Source for ToF-SIMS Depth Profiling of Insulating Materials: High Sputter Rate and Accurate Interfacial Information

Published:2015-05-08 Issue:8 Volume:26 Page:1283-1290
ISSN:1044-0305
Container-title:Journal of the American Society for Mass Spectrometry
language:en
Short-container-title:J. Am. Soc. Mass Spectrom.

Author:

Wang Zhaoying¹²,Liu Bingwen²,Zhao Evan W.²,Jin Ke²,Du Yingge³,Neeway James J.⁴,Ryan Joseph V.⁴,Hu Dehong²,Zhang Kelvin H. L.³,Hong Mina²,Le Guernic Solenne²,Thevuthasan Suntharampilai²,Wang Fuyi¹,Zhu Zihua²

Affiliation:

1. Beijing National Laboratory for Molecular Sciences, CAS Key Laboratory of Analytical Chemistry for Living Biosystems, Beijing Centre for Mass Spectrometry, Institute of Chemistry, Chinese Academy of Sciences, 100190, Beijing, People’s Republic of China

2. W. R. Wiley Environmental Molecular Sciences Laboratory, Pacific Northwest National Laboratory, 99354, Richland, WA, USA

3. Fundamental and Computer Sciences Directorate, Pacific Northwest National Laboratory, 99354, Richland, WA, USA

4. Energy and Environment Directorate, Pacific Northwest National Laboratory, 99354, Richland, WA, USA

Publisher

American Chemical Society (ACS)

Subject

Spectroscopy,Structural Biology

Link

http://link.springer.com/content/pdf/10.1007/s13361-015-1159-1.pdf

Reference31 articles.

1. Vickerman, J.C., Briggs, D.: Tof-Sims: Materials Anaylysis by Mass Spectrometry. ToF-SIMS Materials Analysis by Mass Spectrometry, p. 753. IM Publications and SurfaceSpectra Ltd, Chichester (2001)

2. Vickerman, JC; Briggs, D ToF-SIMS Materials Analysis by Mass Spectrometry20132ChichesterIM Publications and SurfaceSpectra Ltd553709

3. Anderson, O., Scheumann, V., Rothhaar, U., Rupertus, V.: Surface and depth profile analysis of insulating samples by ToF-SIMS. Glass Sci. Technol. 77, 159–165 (2004)

4. Secondary ion mass spectrometry with gas cluster ion beams

5. Secondary ion mass spectrometry with gas cluster ion beams

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