Low energy Xe ion beam engineering in optical, structural and morphological properties of hafnium oxide thin films grown by atomic layer deposition technique
Author:
Publisher
Springer Science and Business Media LLC
Link
https://link.springer.com/content/pdf/10.1007/s10967-024-09747-5.pdf
Reference40 articles.
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3. Fadel M, Azim MOA, Omer OA, Basily RR (1998) A study of some optical properties of hafnium dioxide (HfO2) thin films and their applications. Appl Phys A Mater Sci Process 66:335
4. Pervak V, Krausz F, Apolonski A (2007) Hafnium oxide thin films deposited by reactive middle-frequency dual-magnetron sputtering. Thin Solid Films 515:7984
5. Traylor Kruschwitz JD, Pawlewicz WT (1997) Optical and durability properties of infrared transmitting thin films. Appl Opt 36:2157
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