Author:
Zhang Ruirui,Xiao Zhexi,Lin Zhenkang,Yan Xinghao,He Ziying,Jiang Hairong,Yang Zhou,Jia Xilai,Wei Fei
Abstract
Highlights
Influence of interface conductive network on ionic transport and mechanical stability under fast charging is explored for the first time.
The mitigation of interface polarization is precisely revealed by the combination of 2D modeling simulation and Cryo-TEM observation, which can be attributed to a higher fraction formation of conductive inorganic species in bilayer SEI, and primarily contributes to a linear decrease in ionic diffusion energy barrier.
The improved stress dissipation presented by AFM and Raman shift is critical for the linear reduction in electrode residual stress and thickness swelling.
Abstract
Progress in the fast charging of high-capacity silicon monoxide (SiO)-based anode is currently hindered by insufficient conductivity and notable volume expansion. The construction of an interface conductive network effectively addresses the aforementioned problems; however, the impact of its quality on lithium-ion transfer and structure durability is yet to be explored. Herein, the influence of an interface conductive network on ionic transport and mechanical stability under fast charging is explored for the first time. 2D modeling simulation and Cryo-transmission electron microscopy precisely reveal the mitigation of interface polarization owing to a higher fraction of conductive inorganic species formation in bilayer solid electrolyte interphase is mainly responsible for a linear decrease in ionic diffusion energy barrier. Furthermore, atomic force microscopy and Raman shift exhibit substantial stress dissipation generated by a complete conductive network, which is critical to the linear reduction of electrode residual stress. This study provides insights into the rational design of optimized interface SiO-based anodes with reinforced fast-charging performance.
Publisher
Springer Science and Business Media LLC
Subject
Electrical and Electronic Engineering,Surfaces, Coatings and Films,Electronic, Optical and Magnetic Materials
Cited by
1 articles.
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