A novel defect detection and identification method in optical inspection

Author:

Xie Liangjun,Huang Rui,Gu Nong,Cao Zhiqiang

Publisher

Springer Science and Business Media LLC

Subject

Artificial Intelligence,Software

Reference33 articles.

1. Chou PB, Rao AR, Struzenbecker MC, Wu FY, Brecher VH (1997) Automatic defect classification for semiconductor manufacturing. Mach Vis Appl 9(4):201–214

2. Cho H, Park WS (2002) Neural network applications in automated optical inspection: state of the arts, algorithms and systems for optical information processing VI. In: Javidi B, Psaltis D (eds) Proceedings of SPIE, vol 4789

3. Moganti M, Ercal F (1998) A subpattern level inspection system for printed circuit boards. Comput Vis Underst 70(1):51–62

4. Ken R, Brain S, Neil H (1991) Using full wafer defect maps as process signatures to monitor and control yield. IEEE/SEMI semiconductor manufacturing science symposium, pp 129–135

5. Chen FL, Liu SF (2000) A neural-network approach to recognize defect spatial pattern in semiconductor fabrication. IEEE Trans Semicond Manuf 13(3):366–373

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