Author:
Lorenz J. K.,Baer E.,Burenkov A.,Erdmann A.,Evanschitzky P.,Pichler P.
Publisher
Springer Science and Business Media LLC
Subject
Electrical and Electronic Engineering,Modeling and Simulation,Atomic and Molecular Physics, and Optics,Electronic, Optical and Magnetic Materials
Reference59 articles.
1. Antoniadis, D.A., Dutton, R.W.: IEEE Trans. Electron Devices ED-26(4), 490 (1979). doi: 10.1109/T-ED.1979.19452
2. The International Technology Roadmap for Semiconductors: 2012 edition. www.itrs.net
3. Wong, A.K.K.: Resolution Enhancement Techniques in Optical Lithography. SPIE, Bellingham (2001)
4. Miller, A., Provoost, J., Maenhoudt, M.: Future Fab Int. 29, 66 (2009). http://www.future-fab.com/chapters.asp?v=29
5. Description of lithography simulator PROLITH. www.kla-tencor.com
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