Photoabbau von Polymethylmethacrylat in Lösung-Reference-Cited by-同舟云学术

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Photoabbau von Polymethylmethacrylat in Lösung

Published:1971-10 Issue:1-2 Volume:248 Page:871-876
ISSN:0023-2904
Container-title:Kolloid-Zeitschrift und Zeitschrift für Polymere
language:de
Short-container-title:Kolloid-Z.u.Z.Polymere

Author:

Braun D.,Berger J.

Publisher

Springer Science and Business Media LLC

Subject

Materials Chemistry,Colloid and Surface Chemistry,Polymers and Plastics,Physical and Theoretical Chemistry

Link

http://link.springer.com/content/pdf/10.1007/BF01508043.pdf

Reference17 articles.

1. Berger, J. undM. Lazár, J. Polymer Sci. C,22, 131 (1968).

2. Baum, C. E. H., A. Ledwith undA. Parry, Chem. Commun.20, 490 (1965).

3. Bawn, C. E. H. undA. Ledwith, Brit, Patent Nr. 1083 234, angemeldet am 19. 5. 1965.

4. Berlin, A. A., Vysokomol. Soedin.8, 1336 (1966).

5. Bischof, J. undV. Desreux, Bull. Soc. Chim. Belges61, 10 (1952).

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Characterization of a Dissociative Excited State in the Solid State: Photochemistry of Poly(methyl methacrylate). Photochemical Processes in Polymeric Systems. 5;Macromolecules;1980-11

2. Photosensitivity of methylene chloride, stimulated by free radicals;Bulletin of the Academy of Sciences of the USSR Division of Chemical Science;1976-09

3. Photoabbau von Polymethylmethacrylat in Lösung;Kolloid-Zeitschrift & Zeitschrift für Polymere;1972-02

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