Study on Photoresist Transfer in Rotational Near-Field Photolithography Using Molecular Dynamics Simulation-Reference-Cited by-同舟云学术

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Study on Photoresist Transfer in Rotational Near-Field Photolithography Using Molecular Dynamics Simulation

Published:2021-04-10 Issue:5 Volume:16 Page:1799-1807
ISSN:1557-1955
Container-title:Plasmonics
language:en
Short-container-title:Plasmonics

Author:

Ji Jiaxin^ORCID,He Sheng,Lin Zhongwen,Sun Shaohua,Hu Yueqiang,Meng Yonggang,Wang Shuangqing

Funder

Young Scientists Fund

Natural Science Foundation of Shandong Province

Universities of the Central South University

Shandong Key of Research and Development Plan

Publisher

Springer Science and Business Media LLC

Subject

Biochemistry,Biophysics,Biotechnology

Link

https://link.springer.com/content/pdf/10.1007/s11468-021-01397-7.pdf

Reference33 articles.

1. Bao W, Staffaroni M, Bokor J, Salmeron MB, Yablonovitcis E, Cabrini S, Bargion AW, Schuck PJ (2013) Plasmonic near-field probes: a comparsion of the campanile geometry with other sharp tips. Opt Express 21(7):8166–8176

2. Gao M, Cho M, Han HJ, Jung YS, Park I (2018) Palladium-decorated silicon nanomesh fabricated by nanosphere lithography for high performance, room temperature hydrogen Sensin. Small 14(10):1703691

3. Stockman MI (2015) Nanoplasmonic sensing and detection. Science 348(6232):287–288

4. Altissimo M (2010) E-beam lithography for micro-/nanofabrication. Biomicrofluidics 4(2):026503

5. Tseng AA (2007) Recent developments in nanofabrication using scanning near-field optical microscope lithography. Opt Laser Technol 39(3):514–526

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