1. John L. Vossen and Werner Kern, eds., Thin Film Processes, Academic Press, New York, N.Y., 1978.
2. L.I. Maissel and R. Glang, eds., Handbook of Thin Film Technology, McGraw-Hill, New York, N.Y., 1970.
3. C.F. Powell, J.H. Oxley and J.M. Blocher, Jr., eds., Vapor Deposition, John Wiley & Sons, Inc. New York, N.Y., 1966, pp. 249–342.
4. R.A. Holzl, “Chemical Vapor Deposition Techniques,” in Techniques of Metals Research, Vol. 1, Part 3, R.F. Bunshah, ed., Interscience Publishers, New York, N.Y., 1968, pp. 1377–1405.
5. W.M. Feist, S.R. Steele and D.W. Readey, “The Preparation of Films by Chemical Vapor Deposition,” in Physics of Thin Films, Vol. 5, G. Hass and R.E. Thun, eds., Academic Press, New York, N.Y., 1969, pp. 237–322.