Atomic hydrogen concentration mapping in thermal plasma chemical vapour deposition-Reference-Cited by-同舟云学术

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Atomic hydrogen concentration mapping in thermal plasma chemical vapour deposition

Published:2001-03 Issue:4 Volume:72 Page:455-464
ISSN:0946-2171
Container-title:Applied Physics B
language:en
Short-container-title:Appl Phys B

Author:

Larjo J.,Walewski J.,Hernberg R.

Publisher

Springer Science and Business Media LLC

Subject

General Physics and Astronomy,Physics and Astronomy (miscellaneous),General Engineering

Link

http://link.springer.com/content/pdf/10.1007/s003400100500.pdf

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Foundations of High-Pressure Thermal Plasmas;Plasma Sources Science and Technology;2018-06-05

2. Thermal plasmas for nanofabrication;Journal of Physics D: Applied Physics;2011-04-14

3. Production and Detection of H Atoms and Vibrationally Excited H2 Molecules in CVD Processes;Chemical Vapor Deposition;2010-12

4. The effects of metal vapour in arc welding;Journal of Physics D: Applied Physics;2010-10-15

5. Influence of gas temperature on the loss mechanisms of H-atoms in a pulsed microwave discharge identified by time-resolved LIF measurements;Plasma Sources Science and Technology;2006-06-09

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