Problems in applying secondary reactions to the activation analysis of semiconductor surface layers-Reference-Cited by-同舟云学术

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Problems in applying secondary reactions to the activation analysis of semiconductor surface layers

Published:1971-10 Issue:1 Volume:9 Page:39-46
ISSN:0134-0719
Container-title:Journal of Radioanalytical Chemistry
language:en
Short-container-title:J. Radioanal. Chem.

Author:

Rausch H.,Salamon A.,Szabó E.

Publisher

Springer Science and Business Media LLC

Subject

Health, Toxicology and Mutagenesis,Public Health, Environmental and Occupational Health,Spectroscopy,Pollution,Radiology Nuclear Medicine and imaging,Nuclear Energy and Engineering,Analytical Chemistry

Link

http://link.springer.com/content/pdf/10.1007/BF02514010.pdf

Reference6 articles.

1. J. D. Knight, T. B. Novey, C. V. Cannon, A. Turkevich, Radiochemical Studies. The Fission Products. National Nuclear Energy Series, Div. IV, Vol. 9, Book 3, 1951, p. 326.

2. J. C. Roy, J. J. Hawton,Can. J. Phys., 39 (1961) 1528.

3. K. Lorenzen, D. König,Z. Naturforsch., 16a (1961) 933.

4. K. Vargha, H. Rausch, G. Matok, Hung. Pat. 152. 742, 1968.

5. E. F. Duffek, E. A. Benjamin, C. Mylroie,J. Electrochem. Technol., 3 (1965) 475.

Cited by 3 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Radiochemical separation of fluorine using hydrated tin dioxide as an inorganic ion exchanger;Journal of Radioanalytical Chemistry;1982-03

2. Activation analytical methods for the grading of semiconductor crystals;Journal of Radioanalytical Chemistry;1974-03

3. Bibliography section;Journal of Radioanalytical Chemistry;1972-12

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