Advanced Materials Design of Rare-Earth-Doped Semiconductors by Organometallic Vapor Phase Epitaxy

Author:

Fujiwara Yasufumi,Terai Yoshikazu,Nishikawa Atsushi

Publisher

Springer Japan

Reference23 articles.

1. Dierolf V, Fujiwara Y, Hommerich U, Ruterana P, Zavada JM (eds) (2009) Materials Research Society symposium proceedings, rare-earth doping of advanced materials for photonic applications, vol 1111. Materials Research Society, Pennsylvania

2. Fujiwara Y, Ofuchi H, Tabuchi M, Takeda Y (2000) In: Manasreh MO (ed) InP and related compounds—materials, applications and devices, optoelectronic properties of semiconductors and superlattices, vol 9. Gordon and Breach Science, Amsterdam, p 251

3. Fujiwara Y, Matsubara N, Tsuchiya J, Ito T, Takeda Y (1997) Effects of growth temperature on Er-related photoluminescence in Er-doped InP and GaAs grown by organometallic vapor phase epitaxy with tertiarybutylphosphine and tertiarybutylarsine. Jpn J Appl Phys 36:2587

4. Fujiwara Y, Curtis AP, Stillman GE, Matsubara N, Takeda Y (1998) Low-temperature photoluminescence study on Er-doped GaP grown by organometallic vapor phase epitaxy. J Appl Phys 83:4902

5. Favennec PN, L’Haridon H, Moutonnet D, Salve M, Gauneau M (1990) Optical activation of Er3+ implanted in silicon by oxygen impurities. Jpn J Appl Phys 29:L524

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