Influence of charge and discharge of electric double layer in pulse plating-Reference-Cited by-同舟云学术

登录注册会员服务联系我们

Influence of charge and discharge of electric double layer in pulse plating

Published:1980-11 Issue:6 Volume:10 Page:775-784
ISSN:0021-891X
Container-title:Journal of Applied Electrochemistry
language:en
Short-container-title:J Appl Electrochem

Author:

Puippe J. Cl.,Ibl N.

Publisher

Springer Science and Business Media LLC

Subject

Materials Chemistry,Electrochemistry,General Chemical Engineering

Link

http://link.springer.com/content/pdf/10.1007/BF00611281.pdf

Reference17 articles.

1. Report of the AES pulse plating symposium in Boston,Plating 66 (6) (1979) 36.

2. M. Murphy, Report of the AES pulse plating symposium in Boston,Metal Finishing 77 (6) (1979) 77.

3. Ch. J. Raub,Metalloberfl�che 33 (1979) 437.

4. W. Paatsch,Galvanotechnik 70 (1979) 1111.

5. N. Ibl,Surface Technol. 10 (1980) 81.

Cited by 121 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Anodic oxidation by electrical power pulses for alachlor degradation;Environmental Technology;2024-08-16

2. Efficiency Enhancement for Alkaline Water Electrolyzers Directly Driven by Fluctuating PV Power;IEEE Transactions on Industrial Electronics;2024-06

3. Pseudo lamellae of Cu6Sn5 on the crystal facet of Sn in electrodeposited eutectic Sn-Cu lead-free solder;Materials Today Communications;2024-03

4. Advances in electrode synthesis and fabrication for electrochemical water splitting;Fuel;2024-02

5. Pulse Electroplating of Gold-Nickel Alloys: Morphological and Aesthetic Improvement Compared to DC;Journal of The Electrochemical Society;2024-01-01

同舟云学术

1.学者识别学者识别

2.学术分析学术分析

3.人才评估人才评估

"同舟云学术"是以全球学者为主线，采集、加工和组织学术论文而形成的新型学术文献查询和分析系统，可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容，当前同舟云学术共收录了国内外主流学术期刊6万余种，收集的期刊论文及会议论文总量共计约1.5亿篇，并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询！咨询电话：010-8811{复制后删除}0370

www.globalauthorid.com

TOP