UV and E-Beam Direct Patterning of Photosensitive CSD Films
Author:
Publisher
Springer Vienna
Link
http://link.springer.com/content/pdf/10.1007/978-3-211-99311-8_20
Reference99 articles.
1. Tohge N, Shinmou K, Minami T (1994) Photolysis of organically modified gel films and its application to the fine-patterning of oxide thin films. In: Mackenzie JD (ed) Sol–gel optics III, Proc SPIE 2288, p 589
2. Shinmou K, Tohge N, Minami T (1994) Fine-patterning of ZrO2 thin films by the photolysis of chemically modified gel films. Jpn J Appl Phys 33:L1181
3. Tohge N, Shinmou K, Minami T (1994) Effects of UV-irradiation on the formation of oxide thin films from chemically modified metal-alkoxides. J Sol-Gel Sci Tech 2:581
4. Zhao G, Tohge N (1995) Fine patterning of Al2O3 thin films by the photolysis of gel films chemically modified with benzoylacetone. J Ceram Soc Jpn 103:1293 (in Japanese)
5. Zhao G, Tohge N (1998) Preparation of photosensitive gel films and fine patterning of amorphous Al2O3-SiO2 thin films. Mater Res Bull 33:21
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