CVD Diamond Films for SOI Technologies-Reference-Cited by-同舟云学术

CVD Diamond Films for SOI Technologies

Published: Issue: Volume: Page:77-84
ISSN:
Container-title:Science and Technology of Semiconductor-On-Insulator Structures and Devices Operating in a Harsh Environment
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Author:

Ralchenko V.,Galkina T.,Klokov A.,Sharkov A.,Chernook S.,Martovitsky V.

Publisher

Springer-Verlag

Link

http://link.springer.com/content/pdf/10.1007/1-4020-3013-4_7.pdf

Reference16 articles.

1. B. Dischler, C. Wild (Eds), Low-Pressure Synthetic Diamond: Manufacturing and Applications, Springer, Berlin, 1998.

2. S.E. Coe, R.S. Sussmann, Optical, thermal and mechanical properties of CVD diamond, Diamond Relat. Mater. 9, 1726–1729 (2000).

3. V.G. Ralchenko, A.A. Smolin, et al. Large-area diamond deposition by microwave plasma, Diamond Relat. Mater. 6, 417–421 (1997).

4. D.M. Gruen, Nanocrystalline diamond films, Ann. Rev. Mater. Sci. 29, 211–259 (1999).

5. V. Ralchenko, Nano-and microcrystalline CVD diamond films on surfaces with intricate shape, in Nanostructured Thin Films and Nanodispersion Strengthened Coatings, NATO Science Series, II: Mathematics, Physics and Chemistry, Kluwer (in press).

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