Abstract
AbstractWe consider sparse digraphs generated by the configuration model with given in-degree and out-degree sequences. We establish that with high probability the cover time is linear up to a poly-logarithmic correction. For a large class of degree sequences we determine the exponent $$\gamma \ge 1$$
γ
≥
1
of the logarithm and show that the cover time grows as $$n\log ^{\gamma }(n)$$
n
log
γ
(
n
)
, where n is the number of vertices. The results are obtained by analysing the extremal values of the stationary distribution of the digraph. In particular, we show that the stationary distribution $$\pi $$
π
is uniform up to a poly-logarithmic factor, and that for a large class of degree sequences the minimal values of $$\pi $$
π
have the form $$\frac{1}{n}\log ^{1-\gamma }(n)$$
1
n
log
1
-
γ
(
n
)
, while the maximal values of $$\pi $$
π
behave as $$\frac{1}{n}\log ^{1-\kappa }(n)$$
1
n
log
1
-
κ
(
n
)
for some other exponent $$\kappa \in [0,1]$$
κ
∈
[
0
,
1
]
. In passing, we prove tight bounds on the diameter of the digraphs and show that the latter coincides with the typical distance between two vertices.
Funder
Università degli Studi Roma Tre
Publisher
Springer Science and Business Media LLC
Subject
Statistics, Probability and Uncertainty,Statistics and Probability,Analysis
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