Characteristics of growth of complex ferroelectric oxide films by plasma-ion sputtering-Reference-Cited by-同舟云学术

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Characteristics of growth of complex ferroelectric oxide films by plasma-ion sputtering

Published:1981-02 Issue:2 Volume:24 Page:102-106
ISSN:0038-5697
Container-title:Soviet Physics Journal
language:en
Short-container-title:Soviet Physics Journal

Author:

Mukhortov V. M.,Golovko Yu. I.,Mukhortov Vl. M.,Dudkevich V. P.

Publisher

Springer Science and Business Media LLC

Subject

General Physics and Astronomy,General Physics and Astronomy

Link

http://link.springer.com/content/pdf/10.1007/BF00895350.pdf

Reference14 articles.

1. Vl. M. Mukhortov, V. P. Dudkevich, V. S. Bondarenko, V. S. Mikhalevskii, and E. G. Fesenko, Izv. Akad. Nauk SSSR, Neorg. Mater.,11, 2010 (1975).

2. Vl. M. Mukhortov, Thesis for Candidate's Degree [in Russian], Rostov-on-Don State University (1978).

3. V. P. Dudkevich and E. G. Fesenko, Physics of Ferroelectric Films [in Russian], Rosto-von-Don State University (1979).

4. E. Gillam, J. Phys. Chem. Solids,11, 55 (1959).

5. Vl. M. Mukhortov, A. M. Margolin, V. P. Dudkevich, V. S. Mikhalevskii, and E. G. Fesenko, Zh. Tekh. Fiz.,45, 396 (1975).

Cited by 2 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. New modalities of strain-control of ferroelectric thin films;Journal of Physics: Condensed Matter;2016-05-17

2. Enhancement of Ferroelectric Curie Temperature in BaTiO3Films via Strain-Induced Defect Dipole Alignment;Advanced Materials;2014-08-05

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