Wet-chemical etching of Mn-Zn ferrite by focused Ar+-laser irradiation in H3PO4-Reference-Cited by-同舟云学术

Wet-chemical etching of Mn-Zn ferrite by focused Ar+-laser irradiation in H3PO4

Published:1988-12 Issue:4 Volume:47 Page:319-325
ISSN:0721-7250
Container-title:Applied Physics A: Solids and Surface
language:en
Short-container-title:Appl. Phys. A

Author:

Lu Yong Feng,Takai M.,Nagatomo S.,Namba S.

Publisher

Springer Science and Business Media LLC

Subject

General Materials Science,General Chemistry,Physics and Astronomy (miscellaneous),General Engineering,General Materials Science

Link

http://link.springer.com/content/pdf/10.1007/BF00615495.pdf

Reference8 articles.

1. M. Takai, S. Nagatomo, T. Koizumi, Y.F. Lu, K. Gamo, S. Namba:Laser Processing and Diagnostics II, ed. by D. Bäuerle, K.L. Kompa, L. Lande (Les Editions de Physique 1986) p. 57

2. M. Takai, Y.F. Lu, T. Koizumi, S. Nagatomo, S. Namba: Appl. Phys. A46, 197 (1988)

3. J.T. Tsao, D.J. Ehrlich: Appl. Phys. Lett.43, 146 (1983)

4. M. Eyett, D. Bäuerle, W. Wersing, K. Lubitz, H. Thomann: Appl. Phys. A40, 235 (1986)

5. M. Eyett, D. Bäuerle, W. Wersing, H. Thomann: J. Appl. Phys.62, 1511 (1987)

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