Comparative Investigation of Band Gap and Gate Metal Engineered Novel Si0.2Ge0.8/GaAs Charge Plasma-Based JLTFET for Improved Electrical Performance

Author:

Kumar KaushalORCID,Kumar AjayORCID,Kumar VinayORCID,Sharma Subhash ChanderORCID

Publisher

Springer Science and Business Media LLC

Subject

Electronic, Optical and Magnetic Materials

Cited by 7 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Band gap and gate dielectric engineered novel Si0.9Ge0.1/InAs junctionless TFET for RFIC applications;Engineering Research Express;2024-08-22

2. Design and Investigation of Charge Plasma Based NCFET on MFIS and MFMIS Structure;2024 2nd International Conference on Device Intelligence, Computing and Communication Technologies (DICCT);2024-03-15

3. Performance Optimization of ZnO/CsSnGeI3/CuSCN Perovskite Solar Cells Using Numerical Approach;2024 2nd International Conference on Device Intelligence, Computing and Communication Technologies (DICCT);2024-03-15

4. Highly Linear and Low Noise Shell Doped GaN Junctionless Nanotube TeraFET for the Design of Ultra-Wideband LNA in 6G Communications;IEEE Transactions on Nanotechnology;2024

5. Optimizing RF Parameters in Novel Si1-xGex/GaAs JLTFET Through Ge Mole Fraction Variation;2023 International Conference on Electrical, Electronics, Communication and Computers (ELEXCOM);2023-08-26

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