Effect of SF6 Plasma Etching on the Optical, Morphological and Structural Properties of SiC Films-Reference-Cited by-同舟云学术

Effect of SF6 Plasma Etching on the Optical, Morphological and Structural Properties of SiC Films

Published:2023-08-10 Issue:18 Volume:15 Page:7745-7754
ISSN:1876-990X
Container-title:Silicon
language:en
Short-container-title:Silicon

Author:

de Almeida Maribondo Galvão Nierlly Karinni,Godoy Junior Armstrong,de Jesus Pereira André Luis,Martins Gislene Valdete,Pessoa Rodrigo Sávio,Maciel Homero Santiago,Fraga Mariana Amorim

Funder

Conselho Nacional de Desenvolvimento Científico e Tecnológico

MackPesquisa

Publisher

Springer Science and Business Media LLC

Subject

Electronic, Optical and Magnetic Materials

Link

https://link.springer.com/content/pdf/10.1007/s12633-023-02618-w.pdf

Reference36 articles.

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2. Herth E et al (2019) Fast ultra-deep silicon cavities: Toward isotropically etched spherical silicon molds using an ICP-DRIE. J Vac Sci Technol B 37(2):021206. https://doi.org/10.1116/1.5081503

3. Herth E, Belharet D, Edmond S, Bouville D, Robert L, Lardet‐Vieudrun F (2021) Screening of spherical moulds manufactured isotropically in plasma etching conditions. Contrib Plasma Phys 61(7). https://doi.org/10.1002/ctpp.202100023

4. Racka-Szmidt K, Stonio B, Zelazko J, Filipiak M, Sochacki M (2022) A Review: Inductively Coupled Plasma Reactive Ion Etching of Silicon Carbide. Materials 15:123

5. Fraga MA, Bosi M, Negri M (2015) Silicon Carbide in Microsystem Technology — Thin Film Versus Bulk Material. Adv Silicon Carbide Devices Process. https://doi.org/10.5772/60970

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