Growth of Cr2O3 on n-Silicon Substrate using AACVD and its Application as a Hole Selective Layer
Author:
Publisher
Springer Science and Business Media LLC
Subject
Electronic, Optical and Magnetic Materials
Link
https://link.springer.com/content/pdf/10.1007/s12633-023-02791-y.pdf
Reference35 articles.
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3. Soonmin H (2022) A review of metal oxide thin films in solar cell applications. Int J Thin Film Sci Technol 11:37–45. https://doi.org/10.18576/ijtfst/110105
4. Lin W, Wu W, Liu Z et al (2018) Chromium trioxide hole-selective heterocontacts for silicon solar cells. ACS Appl Mater Interfaces 10:13645–13651. https://doi.org/10.1021/acsami.8b02878
5. Lin W, Wu W, Bao J et al (2018) Novel hole selective CrOx contact for dopant-free back contact silicon solar cells. Mater Res Bull 103:77–82. https://doi.org/10.1016/j.materresbull.2018.03.032
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