Abnormal grain growth in copper films during magnetically enhanced plasma processing-Reference-Cited by-同舟云学术

Abnormal grain growth in copper films during magnetically enhanced plasma processing

Published:1992-12 Issue:12 Volume:21 Page:1087-1091
ISSN:0361-5235
Container-title:Journal of Electronic Materials
language:en
Short-container-title:JEM

Author:

Naeem M. D.,Leary H. J.,Rajan K.

Publisher

Springer Science and Business Media LLC

Subject

Materials Chemistry,Electrical and Electronic Engineering,Condensed Matter Physics,Electronic, Optical and Magnetic Materials

Link

http://link.springer.com/content/pdf/10.1007/BF02667598.pdf

Reference10 articles.

1. H. Y. Lee, G. S. Oehrlein and C. Ransom, Rad. Eff. & Defects in Solids,111 & 112, 221 (1989).

2. H. P. Strunk, H. Cerva and E. G. Mohr, J. Electrochem. Soc.135, 2876 (1988).

3. P. Krulevitch, T. D. Nguyen, G. C. Johnson, R. T. Howe, H. R. Wenk and R. Gronsky, Evol. Thin Films & Surf. Micro. Symp. Proc. (1991), p 167.

4. A. Katz, S. Nakahara, S. N. G. Chu, B. E. Weir, C. R. Abe- mathy, W. S. Hobson, S. J. Pearton and W. Savin, in Long Wavelength Semiconductor Devices, Mat. & Processes- Symp. (1991), p 305.

5. A. N. Didenko, A. E. Ligachev, Y. P. Sharkeev, G. V. Pushkareva, E. V. Kozlov, A. I. Ryabchikov, R. A. Nasyrov and G. I. Shakhmeister, Nucl. Instrum. Methods Phys. Res.B61, 441 (1991).

Cited by 7 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Effect of Low-Energy Ion Bombardment on the Texture and Microstructure of Platinum Films;Journal of Surface Investigation: X-ray, Synchrotron and Neutron Techniques;2023-02

2. Influence of Low-Energy Ion Bombardment on the Texture and Microstructure of Pt Films;Поверхность. Рентгеновские, синхротронные и нейтронные исследования;2023-02-01

3. Secondary Recrystallization in Metals: Approach by Solid-State Wetting;Korean Journal of Metals and Materials;2014-09-05

4. Low energy ion beam assisted grain size evolution in thin film deposition;Journal of Electronic Materials;1997-11

5. Thin‐film temperature rise estimates during low energy ion bombardment in a plasma reactor;Applied Physics Letters;1995-05-08